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Ceramic filter For Electronics and Semiconductors

Engineering

Technical Support

It reduces the amount of water intake and drainage used in the semiconductor / liquid crystal manufacturing process.
Stable operation facilitates operation management and maintenance.
[Filtration] [Recovery] [Separation] [Concentration] [Purification]

Option
  • Filtrate tank
  • Two-stage concentration unit
  • Filter cleaning chemical injection unit
  • Clean room compatible unit
  • Heat exchange unit

Features

By filtering and collecting the wastewater, the amount of wastewater can be drastically reduced.
  • 99.9% or more of the filtered liquid can be expected to be recovered from the DC processed wastewater.
  • 99.5% or more of the filtered liquid can be expected to be recovered from BG processed wastewater.
  • 99% or more of the filtrate can be expected to be recovered from CMP wastewater.
By using the filtrate as the raw water of the pure water device, the load on the pure water device can be reduced.
By circulating water, the amount of water intake and drainage can be drastically reduced.
There are no consumables and running costs can be reduced.
There is no damage to the filter, which makes operation management easier.

Delivery example

Application Silicon wafer DC processing Wastewater recovery
Model  7M3-2S3P
Filter  MBX3-1020-0.1 (Membrane pore size: 0.1 μm)
Filtration area 14.7m2
Processing amount  5.5m3 / h
Wet contact material  SUS304 (inner and outer surface pickling
Weight 3200 kg (operating weight)
Ancillary equipment
  • Undiluted solution tank
  • Circulation pump
  •  Automatic backwash unit
  • Control panel

Main application

  • BG processed wastewater, DC processed wastewater, CMP wastewater
  • Polishing drainage for glass lenses
  • Purification and concentration recovery of electronic pastes and slurries

Specification

Main wastewater permeation flux (FLUX) Membrane pore size  Permeation flux (l / m2h)
DC processing drainage for glass/lenses  0.2 μm 400-600
DC processing wastewater for silicon/gully arsenic wafers 100nm 300-500
BG processing wastewater for silicon/gully arsenic wafers 100nm  200-400
CMP (oxide film) wastewater 50nm 50-100
CMP (metal) drainage 50nm 50-100

We will design according to the customer's specifications, so please contact us.

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